Evolutionary, High Resolution Direct Write Laser Pattern Generator Designed to Meet the Needs of Advanced Lithography

The DWL 200 is Ideally Suited for Quick and Reliable Turnaround Mask or Direct Write Applications such as Reticles, ASICs, MCMs, MEMs, Integrated Optics, Hybrids, Thin-Film Recording Heads, Microwave Devices, Sensors, SAWs, etc.

Laser Optical Technology Provides High Precision on Substrates up to 200mm x 200mm Excellent Placement and Overlay Performance are Ensured by Rigid Temperature Control and Acousto-Optic Beam Steering Elements Includes Metrology Capabilities for Process Control or Measurement Reports

The System’s High Throughput, Fast Data Path and Versatile Substrate Handler all Contribute to Shortening the Total Time from Receipt of the Data to the Final Product. The Incorporated Alignment System Allows the System to Print Multilevel, Aligned Structures on Mass or Other Substrates.

---